Research impact and excellence
UD listed among world's top research universities
3:55 p.m., Nov. 29, 2011--The University of Delaware is listed among the top universities in the world, based on a new report on the production and impact of scientific papers.
The 2011 Performance Ranking of Scientific Papers for World Universities, released by National Taiwan University, is based on statistics of scientific papers that reflect three major performance criteria: research productivity, research impact and research excellence.
Space Grant research
Self-assembled materials, InSPACE
In the rankings of the world's top 300 universities by fields, UD is listed at 192 in Agriculture and Environment Sciences; 141 in Engineering, Computing and Technology; 184 in Natural Sciences; and 266 in Social Sciences.
In subject rankings, UD is represented in chemical engineering, 39; chemistry, 147; civil engineering, 76; computer science, 272; electrical engineering, 186; environment, 173; geoscience, 167;materials science, 133; mathematics, 298; mechanical engineering, 65; physics, 207; and plant and animal sciences, 198.
"These rankings released by National Taiwan University present an objective evaluation of the impact of the research and scholarship at the University of Delaware," said Provost Tom Apple. "Our faculty are providing leadership in many areas of scholarship, and their ideas are impacting colleagues and students around the world."
The Taiwan ranking, formerly published by HEEACT (the Higher Education Evaluation and Accreditation Council of Taiwan), evaluates both short-term and long-term research performance of a university.
HEEACT published its first worldwide university ranking based on scientific paper performance in 2007 and has offered additional field-based rankings between 2008 and 2010. In October of this year, HEEACT released overall rankings based on scientific paper performance, and UD was listed at 303 among the top 500 universities in the world, coming in at 113 among the 158 U.S. institutions in the ranking.