|
|
 |
| Figure 1. Examples of surface
modification reactions. |
Semiconductor
substrates are
widely used in many applications. Multiple practical uses involving
these
materials require the ability to tune their physical (bandgap, electron
mobility) and chemical (functionalization, passivation) properties to
adjust
those to a specific application. The goal of this research direction is
to
develop new strategies for manipulating the surface properties of
semiconductor
materials in a controlled way. Our expertise allows us to selectively
tune the
chemical and physical properties of semiconductor surfaces by an
appropriate
choice of elemental or III-V semiconductor, or by chemical
modification. Our
approach focuses on chemical passivation, on molecular switches and on
the use of a variety of functionalized
self-assembled monolayers. The findings of these investigations will be
relevant for future applications in molecular and nanoelectronics,
sensing, and
solar energy conversion. Because of its interdisciplinary nature, this
work has
grown into a productive collaboration with Professor Robert Opila
(Materials
Science and Engineering,
Timothy Leftwich
trleft@udel.edu
Mark Madachik
mmada@udel.edu
Keith Douglas Keithd@udel.edu
Relevant Publications:
1.
Leftwich, T. R., Madachik, M. R. and Teplyakov, A. V. Dehydrative
cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111):
An ex situ tool for the modification of
semiconductor surfaces. J. Am. Chem. Soc.
2008, 130, 16216-16223.
2. Leftwich, T. R. and Teplyakov, A. V. Chemical Manipulation of Multifunctional Hydrocarbons on Silicon Surfaces. Invited Review. Surf. Sci. Rep. 2008, 63, 1-71.
3. Sullivan, S., Leftwich, T. R., Ni, C.-Y., Teplyakov, A. V and Beebe, T. P., Jr. Growth and surface modification of silicon nanostructures templated using molecule corrals: Parallels with the surface chemistry of single crystalline silicon. Submitted to Langmuir.
